Effect of substrate self-bias and nitrogen flow rate on non-polar AlN film growth by reactive sputtering
31st International Microprocess and nanotechnology Conference. 2018.
NIMS著者
Materials Data Repository (MDR)上の本文・データセット
作成時刻: 2019-03-04 10:09:01 +0900更新時刻: 2019-03-04 10:09:01 +0900