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Effect of substrate self-bias and nitrogen flow rate on non-polar AlN film growth by reactive sputtering
31st International Microprocess and nanotechnology Conference. November 13, 2018-November 16, 2018.
NIMS author(s)
Fulltext and dataset(s) on Materials Data Repository (MDR)
Created at: 2019-03-04 10:09:01 +0900 Updated at: 2019-03-04 10:09:01 +0900