HOME > Presentation > DetailAlGaN/GaNヘテロ界面でのAlNインタ層の効果 ― 歪誘起欠陥形成の抑制による2DEG移動度の向上 ―(Effect of AlN interlayer in AlGaN/GaN heterostructures on both the reduction of strain-induced defects in GaN channel and the improvement of two-dimensional carrier transport)角谷 正友, 中野由崇, 今中 康貴. 第86回応用物理学会秋季学術講演会. September 07, 2025-September 10, 2025.NIMS author(s)SUMIYA, MasatomoIMANAKA, YasutakaFulltext and dataset(s) on Materials Data Repository (MDR)Created at: 2025-09-12 03:12:41 +0900 Updated at: 2025-09-12 03:12:41 +0900