HCl gas etching of (010) and (001) β-Ga2O3 substrates for the fabrication of plasma-damage-free trenches and fins
Compound Semiconductor Week 2023. 2023.
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Materials Data Repository (MDR)上の本文・データセット
作成時刻: 2023-06-09 09:58:05 +0900更新時刻: 2023-06-09 09:58:05 +0900