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Interface Dipole Modulation in HfO2/SiO2 MOS Stack Structures

宮田 典幸, YAMASAKI, Takahiro, Kyoko Sumita, NARA, Jun, Ryousuke Sano, 野平博司.
2018 IEEE International Electron Devices Meeting. 2018.

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    Created at: 2019-03-04 09:37:14 +0900Updated at: 2019-03-04 09:37:14 +0900

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