HOME > Presentation > Detail
反応性スパッタ法を用いた無極性AlN薄膜成長における自己電圧効果の検討
(Self-bias effect on non-polar AlN thin film growth by reactive sputtering)
第79回応用物理学会秋季学術講演会. September 18, 2018-September 21, 2018.
NIMS author(s)
Fulltext and dataset(s) on Materials Data Repository (MDR)
Created at: 2019-03-04 09:37:24 +0900 Updated at: 2019-03-04 09:37:24 +0900