(Invited) Fabrication Technique of Ferroelectric Hf<sub>x</sub>Zr<sub>1−X</sub>O<sub>2</sub> Thin Films Using ALD-ZrO<sub>2</sub> Nucleation Layers | SAMURAI, NIMS Researchers Directory Service

HOME > Misc > Detail

(Invited) Fabrication Technique of Ferroelectric Hf_xZr_1−XO₂ Thin Films Using ALD-ZrO₂ Nucleation Layers

ECS Transactions 112 [1] 75-88. 2023.

https://doi.org/10.1149/11201.0075ecst

NIMS author(s)

ONAYA, Takashi

Fulltext and dataset(s) on Materials Data Repository (MDR)

Created at: 2026-06-18 03:05:51 +0900 Updated at: 2026-10-22 04:34:50 +0900

▲ Go to the top of this page