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抵抗変化メモリ(ReRAM)における導電性パス生成機構の検討 〜第一原理分子動力学法を用いたNiOの様々な面方位の表面状態解析〜
(Study on Formative Mechanism of Conductive Path in Resistive Random Access Memory (ReRAM) -Analyses of Various NiO Surface States Using Ab Initio Calculations-)

森山拓洋, 山崎 隆浩, 大野 隆央, 岸田悟, 木下健太郎.

NIMS author(s)


    Fulltext and dataset(s) on Materials Data Repository (MDR)


      Created at: 2022-10-22 02:18:40 +0900Updated at: 2022-10-22 02:18:40 +0900

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