HOME > 論文 > 書誌詳細A New Phenomenon in the Float-Zone (FZ) Growth of Si NanowiresQuanli Hu, Guoqing Li, Hiroshi Suzuki, Hiroshi Araki, Nobuhiro Ishikawa, Wen Yang, Tetsuji Noda. Journal of Crystal Growth 246 [1-2] 64-68. 2002.https://doi.org/10.1016/s0022-0248(02)01792-x NIMS著者石川 信博Materials Data Repository (MDR)上の本文・データセット作成時刻: 2016-05-24 11:50:44 +0900 更新時刻: 2026-10-03 06:11:32 +0900
