HOME > Article > DetailEffect of silicon implantation and annealing on oxygen in Y3Al5O12SAKAGUCHI, Isao, HISHITA, Shunichi, HANEDA, Hajime, 柳谷高公. Materials Science and Engineering B 10. 1995.NIMS author(s)SAKAGUCHI, IsaoFulltext and dataset(s) on Materials Data Repository (MDR)Created at: 2022-09-05 10:44:08 +0900 Updated at: 2022-09-05 10:44:08 +0900
