Fabrication of <i>β</i> -Ga <sub>2</sub> O <sub>3</sub> /air-gap structures on (010) <i>β</i> -Ga <sub>2</sub> O <sub>3</sub> by wet etching in tetramethylammonium hydroxide (TMAH) | 研究者総覧SAMURAI - 物質・材料研究機構 (NIMS)

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Fabrication of β -Ga ₂ O ₃ /air-gap structures on (010) β -Ga ₂ O ₃ by wet etching in tetramethylammonium hydroxide (TMAH)

Takayoshi Oshima.

Applied Physics Express 18 [11] 116501. 2025.

https://doi.org/10.35848/1882-0786/ae1e59

Open Access IOP Publishing (Publisher) Materials Data Repository (MDR)

NIMS著者

大島孝仁

Materials Data Repository (MDR)上の本文・データセット

MDRavailable Fabrication of <i>β</i> -Ga <sub>2</sub> O <sub>3</sub> /air-gap structures on (010) <i>β</i> -Ga <sub>2</sub> O <sub>3</sub> by wet etching in tetramethylammonium hydroxide (TMAH)

作成時刻: 2025-11-27 03:09:05 +0900 更新時刻: 2025-12-28 07:02:15 +0900

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