Near-surface Sensitive Infrared Reflection Spectroscopy on SiO2 Implanted with High-flux Negative ions
(大電流負イオン注入されたSiO2の表面近傍敏感赤外反射分光)
NIMS author(s)
Fulltext and dataset(s) on Materials Data Repository (MDR)
Created at: 2016-05-24 11:57:17 +0900 Updated at: 2026-10-08 08:04:56 +0900