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Effect of the film thickness on the crystal structure and ferroelectric properties of (Hf 0.5 Zr 0.5 )O 2 thin films deposited on various substrates

著者Takahisa Shiraishi, Kiliha Katayama, Tatsuhiko Yokouchi, Takao Shimizu, Takahiro Oikawa, Osami Sakata, Hiroshi Uchida, Yasuhiko Imai, Takanori Kiguchi, Toyohiko J. Konno, Hiroshi Funakubo.
掲載誌名Materials Science in Semiconductor Processing 70 239-245
ISSN: 13698001
ESIでのカテゴリ: MATERIALS SCIENCE
出版社Elsevier BV
発表年2017
言語English
DOIhttps://doi.org/10.1016/j.mssp.2016.12.008
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