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Hot-Pressed Silicon Nitride with Lu2O3 Additives:Oxitation and Its Effect on Strength
(Lu2O3を添加したホットプレス窒化ケイ素の1400℃と1500℃における酸化挙動と酸化後の強度)

Shuqi Guo, Naoto Hirosaki, Toshiyuki Nishimura, Yoshinobu Yamamoto, Mamoru Mitomo.

NIMS author(s)


Fulltext and dataset(s) on Materials Data Repository (MDR)


    Created at: 2016-05-24 11:59:40 +0900 Updated at: 2026-11-09 08:03:46 +0900

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