HOME > Article > DetailHot-Pressed Silicon Nitride with Lu2O3 Additives:Oxitation and Its Effect on Strength(Lu2O3を添加したホットプレス窒化ケイ素の1400℃と1500℃における酸化挙動と酸化後の強度)Shuqi Guo, Naoto Hirosaki, Toshiyuki Nishimura, Yoshinobu Yamamoto, Mamoru Mitomo. Journal of the American Ceramic Society 86 [11] 1900-1905. 2003.https://doi.org/10.1111/j.1151-2916.2003.tb03579.x NIMS author(s)GUO, ShuqiHIROSAKI, NaotoNISHIMURA, ToshiyukiFulltext and dataset(s) on Materials Data Repository (MDR)Created at: 2016-05-24 11:59:40 +0900 Updated at: 2026-11-09 08:03:46 +0900