Investigating the Growth of CH 3 NH 3 PbI 3 Thin Films on RF‐Sputtered NiO x for Inverted Planar Perovskite Solar Cells: Effect of CH 3 NH 3 + Halide Additives versus CH 3 NH 3 + Halide Vapor Annealing | 研究者総覧SAMURAI - 物質・材料研究機構 (NIMS)

HOME > 論文 > 書誌詳細

Investigating the Growth of CH 3 NH 3 PbI 3 Thin Films on RF‐Sputtered NiO x for Inverted Planar Perovskite Solar Cells: Effect of CH 3 NH 3 + Halide Additives versus CH 3 NH 3 + Halide Vapor Annealing
(ペロブスカイト太陽電池におけるRFスパッタNiOx上のCH3NH3PbI3薄膜成長の研究)

Namrata Pant, Ashish Kulkarni, Masatoshi Yanagida, Yasuhiro Shirai, Tsutomu Miyasaka, Kenjiro Miyano.

Advanced Materials Interfaces 7 [3] 1901748. 2020.

https://doi.org/10.1002/admi.201901748

NIMS著者

Materials Data Repository (MDR)上の本文・データセット

作成時刻: 2020-02-11 03:00:17 +0900更新時刻: 2024-03-30 23:51:43 +0900

▲ページトップへ移動