Diffused back surface field formation in combination with two-step H2annealing for improvement of silicon nanowire-based solar cell efficiency | 研究者総覧SAMURAI - 物質・材料研究機構 (NIMS)

HOME > 論文 > 書誌詳細

Diffused back surface field formation in combination with two-step H2annealing for improvement of silicon nanowire-based solar cell efficiency
(Diffused back surface field formation in combination with two-step H2 annealing for improvement of silicon nanowire-based solar cell efficiency)

Wipakorn Jevasuwan, Ken C. Pradel, Thiyagu Subramani, Junyi Chen, Toshiaki Takei, Kiyomi Nakajima, Yoshimasa Sugimoto, Naoki Fukata.

Japanese Journal of Applied Physics 56 [4S] 04CP01. 2017.

https://doi.org/10.7567/jjap.56.04cp01

NIMS著者

Materials Data Repository (MDR)上の本文・データセット

作成時刻: 2017-02-19 23:43:35 +0900更新時刻: 2024-04-01 21:53:38 +0900

▲ページトップへ移動