Soft X-ray absorption and Emission Study of Silicon Oxynitride/Si(100) interface

Yoshiyuki Yamashita; Kazuhiro Oguchi; Kozo Mukai; Jun Yoshinobu; Yoshihisa Harada; Takashi Tokushima; Shik Shin; Naoyoshi Tamura; Hiroshi Nohira; Takeo Hattori; Yoshiyuki Yamashita; Kazuhiro Oguchi; Kozo Mukai; Jun Yoshinobu; Yoshihisa Harada; Takashi Tokushima; Shik Shin; Naoyoshi Tamura; Hiroshi Nohira; Takeo Hattori

doi:10.1143/jjap.46.l77

Soft X-ray absorption and Emission Study of Silicon Oxynitride/Si(100) interface
(軟X線吸収発光法によるSiON/Si(100)界面の研究)

Yoshiyuki Yamashita, Kazuhiro Oguchi, Kozo Mukai, Jun Yoshinobu, Yoshihisa Harada, Takashi Tokushima, Shik Shin, Naoyoshi Tamura, Hiroshi Nohira, Takeo Hattori.

Japanese Journal of Applied Physics 46 [No. 3] L77-L79. 2007.

https://doi.org/10.1143/jjap.46.l77

NIMS author(s)

YAMASHITA, Yoshiyuki

Fulltext and dataset(s) on Materials Data Repository (MDR)

Created at: 2016-05-24 15:24:23 +0900Updated at: 2024-03-30 01:40:42 +0900

Soft X-ray absorption and Emission Study of Silicon Oxynitride/Si(100) interface(軟X線吸収発光法によるSiON/Si(100)界面の研究)

NIMS author(s)

Fulltext and dataset(s) on Materials Data Repository (MDR)

Soft X-ray absorption and Emission Study of Silicon Oxynitride/Si(100) interface
(軟X線吸収発光法によるSiON/Si(100)界面の研究)