HOME > Article > DetailStability of Si impurity in high-k oxidesUMEZAWA, Naoto, Kenji Shiraishi, CHIKYOW, Toyohiro. MICROELECTRONIC ENGINEERING 1780-1781. 2009.NIMS author(s)CHIKYO, ToyohiroFulltext and dataset(s) on Materials Data Repository (MDR)Created at: 2022-10-21 23:02:04 +0900 Updated at: 2022-10-21 23:02:04 +0900
