In situ engineering hexagonal boron nitride in van der Waals heterostructures with selective SF<sub>6</sub> etching

Hitesh Agarwal; Antoine Reserbat-Plantey; David Barcons Ruiz; Karuppasamy Pandian Soundarapandian; Geng Li; Vahagn Mkhitaryan; Johann Osmond; Helena Lozano; Kenji Watanabe; Takashi Taniguchi; Petr Stepanov; Frank H L Koppens; Roshan Krishna Kumar; Hitesh Agarwal; Antoine Reserbat-Plantey; David Barcons Ruiz; Karuppasamy Pandian Soundarapandian; Geng Li; Vahagn Mkhitaryan; Johann Osmond; Helena Lozano; Kenji Watanabe; Takashi Taniguchi; Petr Stepanov; Frank H L Koppens; Roshan Krishna Kumar

doi:10.1088/2515-7639/adfd15

In situ engineering hexagonal boron nitride in van der Waals heterostructures with selective SF₆ etching

Hitesh Agarwal, Antoine Reserbat-Plantey, David Barcons Ruiz, Karuppasamy Pandian Soundarapandian, Geng Li, Vahagn Mkhitaryan, Johann Osmond, Helena Lozano, Kenji Watanabe, Takashi Taniguchi, Petr Stepanov, Frank H L Koppens, Roshan Krishna Kumar.

Journal of Physics: Materials 8 [4] 045006. 2025.

https://doi.org/10.1088/2515-7639/adfd15

Open Access IOP Publishing (Publisher) Materials Data Repository (MDR)

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MDRavailable In situ engineering hexagonal boron nitride in van der Waals heterostructures with selective SF<sub>6</sub> etching

Created at: 2025-09-23 03:11:27 +0900 Updated at: 2026-09-06 05:41:01 +0900

In situ engineering hexagonal boron nitride in van der Waals heterostructures with selective SF6 etching

NIMS author(s)

Fulltext and dataset(s) on Materials Data Repository (MDR)

In situ engineering hexagonal boron nitride in van der Waals heterostructures with selective SF₆ etching