Effects of heat treatment and in situ high-temperature X-ray diffraction study on the formation of ferroelectric epitaxial Y-doped HfO2 film | 研究者総覧SAMURAI - 物質・材料研究機構 (NIMS)

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Effects of heat treatment and in situ high-temperature X-ray diffraction study on the formation of ferroelectric epitaxial Y-doped HfO2 film

Takanori Mimura, Takao Shimizu, Takanori Kiguchi, Akihiro Akama, Toyohiko J. Konno, Yoshio Katsuya, Osami Sakata, Hiroshi Funakubo.

Japanese Journal of Applied Physics 58 [SB] SBBB09. 2019.

https://doi.org/10.7567/1347-4065/aafed1

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作成時刻: 2019-04-17 03:10:59 +0900更新時刻: 2024-04-02 01:49:52 +0900

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