HOME > 論文 > 書誌詳細Anisotropic non-plasma HCl gas etching of a (010) β-Ga2O3 substrateTakayoshi Oshima, Yuichi Oshima. Applied Physics Express 16 [6] 066501. 2023.https://doi.org/10.35848/1882-0786/acdbb7 Open Access Materials Data Repository (MDR) NIMS著者大島 孝仁大島 祐一Materials Data Repository (MDR)上の本文・データセットMDRavailable Anisotropic non-plasma HCl gas etching of (010) β-Ga2O3 substrate 作成時刻: 2023-06-24 03:28:14 +0900 更新時刻: 2026-09-07 08:28:11 +0900
