HOME > 論文 > 書誌詳細Effective silicon production from SiCl4 source using hydrogen radicals generated and transported at atmospheric pressureYuji Okamoto, Masatomo Sumiya, Yuya Nakamura, Yoshikazu Suzuki. Science and Technology of Advanced Materials 21 [1] 482-491. 2020.https://doi.org/10.1080/14686996.2020.1789438 Open Access Informa UK Limited (Publisher) NIMS著者角谷 正友Materials Data Repository (MDR)上の本文・データセット作成時刻: 2020-11-26 03:00:19 +0900更新時刻: 2024-03-31 01:49:33 +0900