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Effective silicon production from SiCl4 source using hydrogen radicals generated and transported at atmospheric pressure

Yuji Okamoto, Masatomo Sumiya, Yuya Nakamura, Yoshikazu Suzuki.
Science and Technology of Advanced Materials 21 [1] 482-491. 2020.
https://doi.org/10.1080/14686996.2020.1789438
Open Access Informa UK Limited (Publisher)

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Fulltext and dataset(s) on Materials Data Repository (MDR)

    Created at: 2020-11-26 03:00:19 +0900Updated at: 2024-05-01 05:20:31 +0900

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