Yuji Okamoto; Masatomo Sumiya; Yuya Nakamura; Yoshikazu Suzuki

doi:10.1080/14686996.2020.1789438

Effective silicon production from SiCl4 source using hydrogen radicals generated and transported at atmospheric pressure

著者	Yuji Okamoto, Masatomo Sumiya, Yuya Nakamura, Yoshikazu Suzuki.
掲載誌名	Science and Technology of Advanced Materials 21 [1] 482-491 ISSN: 14686996 ESIでのカテゴリ: MATERIALS SCIENCE
出版社	Informa UK Limited
発表年	2020
言語	English
DOI	https://doi.org/10.1080/14686996.2020.1789438
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