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Effective silicon production from SiCl4 source using hydrogen radicals generated and transported at atmospheric pressure

著者Yuji Okamoto, Masatomo Sumiya, Yuya Nakamura, Yoshikazu Suzuki.
掲載誌名Science and Technology of Advanced Materials 21 [1] 482-491
ISSN: 14686996
ESIでのカテゴリ: MATERIALS SCIENCE
出版社Informa UK Limited
発表年2020
言語English
DOIhttps://doi.org/10.1080/14686996.2020.1789438
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