Optically Active Defect Engineering via Plasma Treatment in a MIS‐Type 2D Heterostructure

Yingjie Tao; Ran Tian; Jiayuan Zhou; Kui Chu; Xuegang Chen; Wenshuai Gao; Guopeng Wang; Yuxuan Jiang; Kenji Watanabe; Takashi Taniguchi; Mingliang Tian; Xue Liu; Yingjie Tao; Ran Tian; Jiayuan Zhou; Kui Chu; Xuegang Chen; Wenshuai Gao; Guopeng Wang; Yuxuan Jiang; Kenji Watanabe; Takashi Taniguchi; Mingliang Tian; Xue Liu

doi:10.1002/admi.202400288

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Optically Active Defect Engineering via Plasma Treatment in a MIS‐Type 2D Heterostructure

Yingjie Tao, Ran Tian, Jiayuan Zhou, Kui Chu, Xuegang Chen, Wenshuai Gao, Guopeng Wang, Yuxuan Jiang, Kenji Watanabe, Takashi Taniguchi, Mingliang Tian, Xue Liu.

Advanced Materials Interfaces 11 [29] 2400288. 2024.

https://doi.org/10.1002/admi.202400288

Open Access Wiley (Publisher)

NIMS著者

Materials Data Repository (MDR)上の本文・データセット

作成時刻: 2026-05-08 03:06:00 +0900 更新時刻: 2026-10-13 04:43:38 +0900