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シリコン酸チッ化中の表面応力変動
(Surface stress during plasma oxidation and following Nitridation)

板倉 明子, 成島哲也, 北島 正弘, Tetsuya NARUSHIMA.
SHINKU 45 [3] 127-129. 2002.
https://doi.org/10.3131/jvsj.45.127

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