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(Invited) Role of Oxidant Gas for Atomic Layer Deposition of HfxZr1−XO2 Thin Films on Ferroelectricity of Metal-Ferroelectric-Metal Capacitors

Takashi Onaya, Koji Kita.
ECS Transactions 113 [2] 51-59. 2024.

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      Created at: 2024-05-30 03:37:59 +0900Updated at: 2024-11-05 04:30:59 +0900

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