HOME > 論文 > 書誌詳細Influence of reacting nitrogen gas consistence on the properties of TiN films prepared by rf. magnetron sputteringY. Pihosh, M. Goto, A. Kasahara, T. Oishi, M. Tosa. Applied Surface Science 244 [1-4] 244-247. 2005.https://doi.org/10.1016/j.apsusc.2004.09.173 NIMS著者後藤 真宏Materials Data Repository (MDR)上の本文・データセット作成時刻: 2016-05-24 14:52:32 +0900 更新時刻: 2026-08-29 04:26:00 +0900
