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Top-down fabrication of Ge nanowire arrays by nanoimprint lithography and hole gas accumulation in Ge/Si core–shell nanowires

Applied Surface Science 643 158656. 2024.

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Materials Data Repository (MDR)上の本文・データセット


    作成時刻: 2024-02-07 03:10:18 +0900更新時刻: 2024-04-02 07:32:28 +0900

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