HOME > Article > DetailTop-down fabrication of Ge nanowire arrays by nanoimprint lithography and hole gas accumulation in Ge/Si core–shell nanowiresYong-Lie Sun, Wipakorn Jevasuwan, Naoki Fukata. Applied Surface Science 643 158656. 2024.https://doi.org/10.1016/j.apsusc.2023.158656 NIMS author(s)JEVASUWAN, WipakornFUKATA, NaokiFulltext and dataset(s) on Materials Data Repository (MDR)Created at: 2024-02-07 03:10:18 +0900 Updated at: 2025-03-19 07:19:52 +0900