HOME > 論文 > 書誌詳細High-temperature slow crack growth of an Yb2O3-SiO2-doped hot-pressed silicon nitride ceramics(Yb2O3-SiO2添加ホットプレス窒化ケイ素セラミックスの高温亀裂進展)Shuqi Guo, Naoto Hirosaki, Yoshinobu Yamamoto, Toshiyuki Nishimura, Hidehiko Tanaka. Materials Letters 57 [21] 3257-3264. 2003.https://doi.org/10.1016/s0167-577x(03)00044-2 NIMS著者郭 樹啓廣崎 尚登西村 聡之Materials Data Repository (MDR)上の本文・データセット作成時刻: 2016-05-24 11:57:56 +0900更新時刻: 2024-10-06 04:16:57 +0900