Oxidation behaviour and strength degradation of a Yb2O3-SiO2-doped hot-pressed silicon nitride between 1200 and 1500 C. | 研究者総覧SAMURAI - 物質・材料研究機構 (NIMS)

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Oxidation behaviour and strength degradation of a Yb2O3-SiO2-doped hot-pressed silicon nitride between 1200 and 1500 C.
(Yb2O3とSiO2を添加したホットプレス窒化ケイ素の1200から1500℃における酸化挙動と強度変化)

GUO, Shuqi, HIROSAKI, Naoto, NISHIMURA, Toshiyuki, YAMAMOTO, Yoshinobu, MITOMO, MAMORU.

PHILOSOPHICAL MAGAZINE A-PHYSICS OF CONDENSED MATTER STRUCTURE DEFECTS AND MECHANICAL PROPERTIES 82 [16] 3027-3043. 2002.

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作成時刻: 2016-05-24 11:53:32 +0900 更新時刻: 2018-12-15 00:37:13 +0900

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