Fabrication of Epitaxial In2O3(ZnO)5 Thin Films by r. f. Sputtering and Their Characterization by X-ray and Electron Diffraction | SAMURAI, NIMS Researchers Directory Service

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Fabrication of Epitaxial In2O3(ZnO)5 Thin Films by r. f. Sputtering and Their Characterization by X-ray and Electron Diffraction
(In2O3[ZnO]5 エピタキシャル薄膜の合成と電子線およびX線回折による評価)

OHASHI, Naoki, 萩野剛士, SAKAGUCHI, Isao, HISHITA, Shunichi, 小松学, 竹中正, HANEDA, Hajime, 大橋直樹, 萩野剛士, 菱田俊一, 小松学, 竹中正.

JOURNAL OF CRYSTAL GROWTH 558-563. 2002.

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Created at: 2016-05-24 11:45:45 +0900 Updated at: 2018-12-15 01:28:24 +0900

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