HOME > 論文 > 書誌詳細Positive Hall coefficients obtained from contact misplacement on evident n-type ZnO films and crystals(n型ZnO薄膜、結晶への誤った接触による正のホール係数)Takeshi Ohgaki, Naoki Ohashi, Shigeaki Sugimura, Haruki Ryoken, Isao Sakaguchi, Yutaka Adachi, Hajime Haneda. Journal of Materials Research 23 [09] 2293-2295. 2008.https://doi.org/10.1557/jmr.2008.0300 NIMS著者大垣 武大橋 直樹坂口 勲安達 裕羽田 肇Materials Data Repository (MDR)上の本文・データセット作成時刻: 2016-05-24 15:35:00 +0900更新時刻: 2025-03-13 04:33:17 +0900