HOME > Article > DetailPositive Hall coefficients obtained from contact misplacement on evident n-type ZnO films and crystals(n型ZnO薄膜、結晶への誤った接触による正のホール係数)Takeshi Ohgaki, Naoki Ohashi, Shigeaki Sugimura, Haruki Ryoken, Isao Sakaguchi, Yutaka Adachi, Hajime Haneda. Journal of Materials Research 23 [09] 2293-2295. 2008.https://doi.org/10.1557/jmr.2008.0300 NIMS author(s)OGAKI, TakeshiOHASHI, NaokiSAKAGUCHI, IsaoADACHI, YutakaHANEDA, HajimeFulltext and dataset(s) on Materials Data Repository (MDR)Created at: 2016-05-24 15:35:00 +0900Updated at: 2024-09-07 04:36:56 +0900