Effect of Incident Direction of ArF Laser to Graphite Substrates on the Formation of Photo-Chemical Vapor Deposition SiC Film.
(光CVDによりグラファイト基板上に形成したSiC膜にあたえるArFレーザ入射方向の影響.)
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Created at: 2016-05-24 11:34:16 +0900 Updated at: 2018-12-14 23:12:15 +0900