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Gate tunable magneto-resistance of ultra-thin W Te2devices
(Gate Tunable Magneto-resistance of Ultra-Thin WTe2 Devices)

Xin Liu, Zhiran Zhang, Chaoyi Cai, Shibing Tian, Satya Kushwaha, Hong Lu, Takashi Taniguchi, Kenji Watanabe, Robert J Cava, Shuang Jia, Jian-Hao Chen.
2D Materials 4 [2] 021018. 2017.
https://doi.org/10.1088/2053-1583/aa613b

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    作成時刻: 2017-12-12 20:37:43 +0900更新時刻: 2024-03-30 01:11:09 +0900

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