Formation of Si-Rich Interfaces by Radiation-Induced Diffusion and Microsegregation in CrN/ZrN Nanolayer Coating

Alexander D. Pogrebnjak; Richard F. Webster; Richard D. Tilley; Vladimir V. Buranich; Volodymyr I. Ivashchenko; Yoshihiko Takeda; Keiji Oyoshi; Rimma Sakenova; Katarzyna Piotrowska; Pawel Zukowski; Piotr Konarski; Anatoliy I. Kupchishin; Piotr Budzynski; Alexander D. Pogrebnjak; Richard F. Webster; Richard D. Tilley; Vladimir V. Buranich; Volodymyr I. Ivashchenko; Yoshihiko Takeda; Keiji Oyoshi; Rimma Sakenova; Katarzyna Piotrowska; Pawel Zukowski; Piotr Konarski; Anatoliy I. Kupchishin; Piotr Budzynski

doi:10.1021/acsami.0c19451

Formation of Si-Rich Interfaces by Radiation-Induced Diffusion and Microsegregation in CrN/ZrN Nanolayer Coating

Alexander D. Pogrebnjak, Richard F. Webster, Richard D. Tilley, Vladimir V. Buranich, Volodymyr I. Ivashchenko, Yoshihiko Takeda, Keiji Oyoshi, Rimma Sakenova, Katarzyna Piotrowska, Pawel Zukowski, Piotr Konarski, Anatoliy I. Kupchishin, Piotr Budzynski.

ACS Applied Materials & Interfaces 13 [14] 16928-16938. 2021.

https://doi.org/10.1021/acsami.0c19451

NIMS author(s)

Fulltext and dataset(s) on Materials Data Repository (MDR)

Created at: 2021-05-01 03:00:27 +0900 Updated at: 2026-03-01 05:57:44 +0900