HOME > 論文 > 書誌詳細Amorphous stability of HfO2 based ternary and binary composition spread oxide films as alternative gate dielectricsK. Hasegawa, P. Ahmet, N. Okazaki, T. Hasegawa, K. Fujimoto, M. Watanabe, T. Chikyow, H. Koinuma. Applied Surface Science 223 [1-3] 229-232. 2004.https://doi.org/10.1016/s0169-4332(03)00903-6 NIMS著者知京 豊裕Materials Data Repository (MDR)上の本文・データセット作成時刻 :2016-05-24 14:40:59 +0900 更新時刻 :2020-11-16 23:12:07 +0900