HOME > Article > DetailGa,N solubility limit in co-implanted ZnO measured by secondary ion mass spectrometry(Ga,Nの酸化亜鉛への同時イオン注入における固溶限の2次イオン質量分析計による測定)Manabu Komatsu, Naoki Ohashi, Isao Sakaguchi, Shunichi Hishita, Hajime Haneda. Applied Surface Science 189 [3-4] 349-352. 2002.https://doi.org/10.1016/s0169-4332(01)01026-1 NIMS author(s)OHASHI, NaokiSAKAGUCHI, IsaoFulltext and dataset(s) on Materials Data Repository (MDR)Created at: 2016-05-24 11:49:32 +0900 Updated at: 2026-10-03 06:15:26 +0900