Surface stress in thin oxide layer made by plasma oxidation with applying positive bias
(正バイアスを印加してプラズマ酸化したシリコン酸化層の表面応力)
NIMS author(s)
Fulltext and dataset(s) on Materials Data Repository (MDR)
Created at: 2016-05-24 11:41:29 +0900 Updated at: 2018-12-15 01:03:49 +0900