HOME > Article > DetailGate-Tunable Band Edge in Few-Layer MoS2Michele Masseroni, Isaac Soltero, James G. McHugh, Igor Rozhansky, Xue Li, Alexander Schmidhuber, Markus Niese, Takashi Taniguchi, Kenji Watanabe, Vladimir I. Fal’ko, Thomas Ihn, Klaus Ensslin. Nano Letters 25 [26] 10472-10477. 2025.https://doi.org/10.1021/acs.nanolett.5c01998 Open Access American Chemical Society (ACS) (Publisher) Materials Data Repository (MDR) NIMS author(s)TANIGUCHI, TakashiWATANABE, KenjiFulltext and dataset(s) on Materials Data Repository (MDR)MDRavailable Gate-Tunable Band Edge in Few-Layer MoS<sub>2</sub> Created at: 2025-07-15 03:07:33 +0900 Updated at: 2026-09-30 06:06:42 +0900
