HOME > 論文 > 書誌詳細Effects of nitrosyl fluoride based gas treatment on fluorination and redox reaction at GaN surface and Pt/GaN interfaceTakahiro Nagata, Asahiko Matsuda, Takashi Teramoto, Dominic Gerlach, Peng Shen, Shigenori Ueda, Takako Kimura, Christian Dussarrat, Toyohiro Chikyow. Journal of Applied Physics 137 [9] 095304. 2025.https://doi.org/10.1063/5.0224068 Open Access AIP Publishing (Publisher) Materials Data Repository (MDR) NIMS著者長田 貴弘松田 朝彦上田 茂典知京 豊裕Materials Data Repository (MDR)上の本文・データセットMDRavailable Effects of nitrosyl fluoride based gas treatment on fluorination and redox reaction at GaN surface and Pt/GaN interface 作成時刻: 2025-03-19 03:07:08 +0900 更新時刻: 2026-10-08 09:09:34 +0900
