Diffused Beam Energy to Dope van der Waals Electronics and Boost Their Contact Barrier Lowering

Che-Yi Lin; Mu-Pai Lee; Yuan-Ming Chang; Yi-Tang Tseng; Feng-Shou Yang; Mengjiao Li; Jiann-Yeu Chen; Ciao-Fen Chen; Meng-Yu Tsai; Yi-Chun Lin; Keiji Ueno; Mahito Yamamoto; Shun-Tsung Lo; Chen-Hsin Lien; Po-Wen Chiu; Kazuhito Tsukagoshi; Wen-Wei Wu; Yen-Fu Lin; Che-Yi Lin; Mu-Pai Lee; Yuan-Ming Chang; Yi-Tang Tseng; Feng-Shou Yang; Mengjiao Li; Jiann-Yeu Chen; Ciao-Fen Chen; Meng-Yu Tsai; Yi-Chun Lin; Keiji Ueno; Mahito Yamamoto; Shun-Tsung Lo; Chen-Hsin Lien; Po-Wen Chiu; Kazuhito Tsukagoshi; Wen-Wei Wu; Yen-Fu Lin

doi:10.1021/acsami.2c07679

Diffused Beam Energy to Dope van der Waals Electronics and Boost Their Contact Barrier Lowering

Che-Yi Lin, Mu-Pai Lee, Yuan-Ming Chang, Yi-Tang Tseng, Feng-Shou Yang, Mengjiao Li, Jiann-Yeu Chen, Ciao-Fen Chen, Meng-Yu Tsai, Yi-Chun Lin, Keiji Ueno, Mahito Yamamoto, Shun-Tsung Lo, Chen-Hsin Lien, Po-Wen Chiu, Kazuhito Tsukagoshi, Wen-Wei Wu, Yen-Fu Lin.

ACS Applied Materials & Interfaces 14 [36] 41156-41164. 2022.

https://doi.org/10.1021/acsami.2c07679

NIMS author(s)

TSUKAGOSHI, Kazuhito

Fulltext and dataset(s) on Materials Data Repository (MDR)

Created at: 2022-09-28 03:19:07 +0900Updated at: 2024-04-02 05:24:57 +0900