HOME > 論文 > 書誌詳細Origin of Fermi level pinning in high-k gate stack structures studied by operando hard x-ray photoelectron spectroscopyYoshiyuki Yamashita, Toyohiro Chikyow. Journal of Electron Spectroscopy and Related Phenomena 238 146890. 2020.https://doi.org/10.1016/j.elspec.2019.146890 NIMS著者山下 良之知京 豊裕Materials Data Repository (MDR)上の本文・データセット作成時刻: 2020-01-15 03:00:20 +0900更新時刻: 2024-04-02 01:04:25 +0900
