Via Method for Lithography Free Contact and Preservation of 2D Materials

著者	Evan J. Telford, Avishai Benyamini, Daniel Rhodes, Da Wang, Younghun Jung, Amirali Zangiabadi, Kenji Watanabe, Takashi Taniguchi, Shuang Jia, Katayun Barmak, Abhay N. Pasupathy, Cory R. Dean, James Hone.
掲載誌名	Nano Letters 18 [2] 1416-1420 ISSN: 15306992, 15306984 ESIでのカテゴリ: PHYSICS
出版社	American Chemical Society (ACS)
発表年	2018
言語	English
DOI	https://doi.org/10.1021/acs.nanolett.7b05161
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