Via Method for Lithography Free Contact and Preservation of 2D Materials

Evan J. Telford; Avishai Benyamini; Daniel Rhodes; Da Wang; Younghun Jung; Amirali Zangiabadi; Kenji Watanabe; Takashi Taniguchi; Shuang Jia; Katayun Barmak; Abhay N. Pasupathy; Cory R. Dean; James Hone

doi:10.1021/acs.nanolett.7b05161

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Via Method for Lithography Free Contact and Preservation of 2D Materials

Evan J. Telford, Avishai Benyamini, Daniel Rhodes, Da Wang, Younghun Jung, Amirali Zangiabadi, Kenji Watanabe, Takashi Taniguchi, Shuang Jia, Katayun Barmak, Abhay N. Pasupathy, Cory R. Dean, James Hone.

Nano Letters 18 [2] 1416-1420. 2018.

https://doi.org/10.1021/acs.nanolett.7b05161

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作成時刻: 2019-03-14 00:38:49 +0900更新時刻: 2024-03-31 02:04:10 +0900