Direct Evidence of Polycrystalline Silicon Thin Films Formation during Aluminum Induced Crystallization by In-situ Heating TEM Observation | 研究者総覧SAMURAI - 物質・材料研究機構 (NIMS)

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Direct Evidence of Polycrystalline Silicon Thin Films Formation during Aluminum Induced Crystallization by In-situ Heating TEM Observation
(その場加熱TEM観察によるAl誘起結晶化法に伴う多結晶Si薄膜生成過程の直接観察)

Seiichiro Ii, Takeshi Hirota, Kensuke Fujimoto, Youhei Sugimoto, Naoki Takata, Ken-ichi Ikeda, Hideharu Nakashima, Hiroshi Nakashima.

MATERIALS TRANSACTIONS 49 [4] 723-727. 2008.

https://doi.org/10.2320/matertrans.mra2007312

NIMS著者

井誠一郎

Materials Data Repository (MDR)上の本文・データセット

作成時刻: 2016-05-24 15:41:16 +0900更新時刻: 2024-03-30 00:06:18 +0900

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