HOME > 論文 > 書誌詳細Guiding Principles for Obtaining High-Quality Microcrystalline Silicon at High Growth Rates Using SiH4/H2 Glow-Discharge Plasma(SiH4/H2 グロー放電プラズマによる高品質微結晶シリコン高速作製指針)Chisato Niikura, Naho Itagaki, Akihisa Matsuda. Japanese Journal of Applied Physics 46 [5A] 3052-3058. 2007.https://doi.org/10.1143/jjap.46.3052 NIMS著者新倉 ちさとMaterials Data Repository (MDR)上の本文・データセット作成時刻: 2016-05-24 15:13:42 +0900更新時刻: 2025-02-09 05:03:17 +0900