Crystallinity of In2O3(ZnO)5 films by epitaxial growth with a self-buffer-layer | SAMURAI, NIMS Researchers Directory Service

HOME > Article > Detail

Crystallinity of In2O3(ZnO)5 films by epitaxial growth with a self-buffer-layer
(自己バッファー層を用いた In2O3(ZnO)5 薄膜のエピタキシャル成長)

Naoki Ohashi, Isao Sakaguchi, Shunichi Hishita, Yutaka Adachi, Hajme Hareda, Tsuyoshi Ogino.

Journal of Applied Physics 92 [5] 2378-2384. 2002.

https://doi.org/10.1063/1.1495530

NIMS author(s)

Fulltext and dataset(s) on Materials Data Repository (MDR)

Created at: 2016-05-24 11:48:50 +0900 Updated at: 2026-09-28 04:34:15 +0900

▲ Go to the top of this page