HOME > Article > DetailOxygen-pressure driven balancing of interface and bulk scattering in amorphous oxide semiconductor thin-film transistorsChe-Yi Lin, Yu-Ching Kuo, I-Chen Liu, Feng-Shou Yang, Yuan-Ming Chang, Po-Wen Chiu, Toshihide Nabatame, Mengjiao Li, Kazuhito Tsukagoshi, Yen-Fu Lin. Materials Today Electronics 14 100171. 2025.https://doi.org/10.1016/j.mtelec.2025.100171 Open Access Elsevier BV (Publisher) Materials Data Repository (MDR) NIMS author(s)NABATAME, ToshihideTSUKAGOSHI, KazuhitoFulltext and dataset(s) on Materials Data Repository (MDR)MDRavailable Oxygen-pressure driven balancing of interface and bulk scattering in amorphous oxide semiconductor thin-film transistors Created at: 2025-09-27 03:11:47 +0900 Updated at: 2026-10-08 09:13:13 +0900