Wipakorn Jevasuwan; Yuji Urabe; Tatsuro Maeda; Noriyuki Miyata; Tetsuji Yasuda; Akihiro Ohtake; Hisashi Yamada; Masahiko Hata; Sunghoon Lee; Takuya Hoshii; Mitsuru Takenaka; Shinichi Takagi

doi:10.1143/jjap.51.065701

HOME > 論文 > 書誌詳細

Controlling anion composition at MIS interfaces on III-V channels by plasma processing

Wipakorn Jevasuwan, Yuji Urabe, Tatsuro Maeda, Noriyuki Miyata, Tetsuji Yasuda, Akihiro Ohtake, Hisashi Yamada, Masahiko Hata, Sunghoon Lee, Takuya Hoshii, Mitsuru Takenaka, Shinichi Takagi.

Japanese Journal of Applied Physics 51 [6R] 065701. 2012.

https://doi.org/10.1143/jjap.51.065701

NIMS著者

大竹晃浩

Materials Data Repository (MDR)上の本文・データセット

作成時刻: 2018-06-08 21:34:24 +0900更新時刻: 2024-04-01 22:33:14 +0900